| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique capable of facilitating apparatus design and manufacture, in response to the required throughput, in a coating and developing system. SOLUTION: Processing blocks S2-S4 having the same construction, which are formed by stacking a plurality of unit blocks, including unit blocks for coating film formation and unit blocks for development, are provided so as to be connected forward and backward between a carrier block S1 and an interface block S6. In this way, the processing blocks S2-S4 having the same construction are prepared and the number of processing blocks arranged between the carrier block S1 and the interface block S6 is increased and decreased, thereby the processing speed of the coating and developing apparatus are adjusted; and thus, the apparatus can be easily designed and manufactured, in response to required throughput. COPYRIGHT: (C)2009,JPO&INPIT
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