发明名称 |
FILM-FORMING METHOD, FILM-FORMING APPARATUS, AND STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming method which makes a film adequately cover a step, stably supplies a raw material, and can practically and inexpensively form a high-quality metal film without deteriorating the raw material, and to provide a film-forming apparatus therefor. SOLUTION: The film-forming method comprises the steps of: making a metal salt of a divalent carboxylic acid react with a carboxylic acid to produce a gas of a metal salt of a monovalent carboxylic acid; supplying the gas of the metal salt of the monovalent carboxylic acid onto a substrate 1 to make a film 2 of the metal salt of the monovalent carboxylic acid deposit thereon; and decomposing the film 2 of the metal salt of the monovalent carboxylic acid by giving an energy to the substrate 1 having the film 2 of the metal salt of the monovalent carboxylic acid deposited thereon to form a metal film 3. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009161814(A) |
申请公布日期 |
2009.07.23 |
申请号 |
JP20080000680 |
申请日期 |
2008.01.07 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
GUNJI ISAO;MIYOSHI SHUSUKE;ITO HITOSHI |
分类号 |
C23C16/448;C23C16/16;H01L21/28;H01L21/285 |
主分类号 |
C23C16/448 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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