发明名称 PROCEDE DE FABRICATION D'UNE BARRE D'ARSENIURE DE GALLIUM MONOCRISTALLINE EXEMPTE DE DISLOCATION
摘要 An improved method for drawing dislocation-free, single crystal gallium arsenide rods in which the drawing vessel is filled with an inert gas of a preselected conductivity at a predetermined pressure, additional arsenic is added to maintain a desired partial pressure, and the melt temperature is controlled to initially draw a "narrow-neck" and then decreased until a crystal of the desired diameter is being drawn. The initial drawing of the narrow neck causes the dislocations to travel in the direction of their growth and disappear, after which a crystal of the desired diameter with dislocations may be drawn.
申请公布号 BE795938(A1) 申请公布日期 1973.08.27
申请号 BED795938 申请日期
申请人 SIEMENS A.G., A BERLIN ET A MUNICH (ALLEMAGNE), 发明人
分类号 C30B15/00;C30B15/30;C30B29/42;(IPC1-7):01J/ 主分类号 C30B15/00
代理机构 代理人
主权项
地址