发明名称 |
SiC SINGLE CRYSTAL SEED, SiC INGOT, PRODUCTION METHOD OF SiC SINGLE CRYSTAL SEED, AND PRODUCTION METHOD OF SiC SINGLE CRYSTAL INGOT |
摘要 |
PROBLEM TO BE SOLVED: To suppress generation of heterogeneous polymorphism, and to suppress outflow of crystal dislocation following high-density screw dislocation generation origin introduction, and generation of a crystal defect.SOLUTION: In an SiC single crystal seed having a principal surface having an off-set angle of 2° or more and 20° or less to {0001} plane, and one or more sub-growth surfaces, an initial facet formation surface positioned on the furthermore off-set upstream side than the principal surface, and having such a tilt angle θ to the {0001} plane that its absolute value is below 2° in every direction is included in the sub-growth surface, and the initial facet formation surface has a screw dislocation generation origin.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016204196(A) |
申请公布日期 |
2016.12.08 |
申请号 |
JP20150086810 |
申请日期 |
2015.04.21 |
申请人 |
SHOWA DENKO KK;DENSO CORP;TOYOTA CENTRAL R&D LABS INC |
发明人 |
FURUYA YUKI;SHONAI TOMOHIRO;URAGAMI YASUSHI;GUNJISHIMA TSUKURU |
分类号 |
C30B29/36;C30B33/00 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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