发明名称 XXRAY PHOTOELECTRONIC ANALYSIS
摘要 PURPOSE:To perform analysis of specimen by radiating electron beams of a minute focus to a thin-film-form target, allowing the X-ray locally produced thereby to pass thorugh the thin film specimen and detecting the photoelectrons generated by the photoelectric effect of X-ray radiation.
申请公布号 JPS5260686(A) 申请公布日期 1977.05.19
申请号 JP19750137606 申请日期 1975.11.14
申请人 SHIMADZU SEISAKUSHO LTD 发明人 SOEJIMA KEIGI
分类号 G01N23/225;G01N23/227;H01J49/44 主分类号 G01N23/225
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