Apparatus for adjusting a semiconductor wafer by electron beam illumination

摘要

An apparatus and process is disclosed for the adjustment of a semiconductor wafer by electron beam illumination. An adjustment mark is provided in a semiconductor wafer having a first layer thereon. The mark is formed as a recess which extends through an aperture in the first layer and into the semiconductor wafer. The width of the recess is not greater than its depth. An electron sensitive lacquer layer is provided on the first layer and in a bottom of the recess.