| 发明名称 |
PARTIAL AND SEQUENTIAL EXPOSURE METHOD |
| 摘要 |
PURPOSE:To increase the accuracy, by positioning the both substances for the direction of orthogonal two axes and also by making adjustable the deviation in angle, in partial and sequential exposing method. |
| 申请公布号 |
JPS5384566(A) |
申请公布日期 |
1978.07.26 |
| 申请号 |
JP19760160623 |
申请日期 |
1976.12.29 |
| 申请人 |
FUJITSU LTD;NIPPON TELEGRAPH & TELEPHONE |
发明人 |
HIYANE MASAO;SHIRATORI TAKANAO;HAYASAKA TOUA;SEKIMOTO MISAO |
| 分类号 |
H01L21/30;H01L21/027;H01L21/302 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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