发明名称 SOFT XXRAY COPY MASK AND ITS MANUFACTURE
摘要 <p>PURPOSE:To increase the accuracy of clearance in copying pattern, by providing a plural number of projections of Si monocrystal playing a role of spacer and the mask pattern consisting of the material absorbing soft X-ray on the one jajor surface of Si thin film held with the support frame.</p>
申请公布号 JPS5398780(A) 申请公布日期 1978.08.29
申请号 JP19770012982 申请日期 1977.02.10
申请人 HITACHI LTD;NIPPON TELEGRAPH & TELEPHONE 发明人 TAKEMOTO KAYAO;MIYAZAKI MASARU;NAKAYAMA SATORU;MATSUO SEITAROU
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
代理机构 代理人
主权项
地址