| 发明名称 |
RESIST COMPOSITION |
| 摘要 |
A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator:;;wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group. |
| 申请公布号 |
US2016377980(A1) |
申请公布日期 |
2016.12.29 |
| 申请号 |
US201615192231 |
申请日期 |
2016.06.24 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MIYAGAWA Takayuki;ARAKI Kaoru;ICHIKAWA Koji |
| 分类号 |
G03F7/038 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A resist composition comprising
a resin (A1) which has
a structural unit having a cyclic carbonate,a structural unit represented by formula (II) anda structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group. |
| 地址 |
Tokyo JP |
