| 摘要 |
PROBLEM TO BE SOLVED: To provide: a metal film polishing pad achieving a high polishing speed and having polishing performance with excellent polishing uniformity; and a polishing method using the polishing pad.SOLUTION: A metal film polishing pad has a concentric circle groove with a land width (x) of 5.0-7.0 (mm) and a groove width of 0.25-0.75 (mm). |
