Optoelectronic device and method for producing an optoelectronic device

摘要

A method is provided for producing an optoelectronic device, comprising the steps of providing a substrate, applying a nucleation layer on a surface of the substrate, applying and patterning a mask layer on the nucleation layer, growing a nitride semiconductor in a first growth step, wherein webs are laid which form a lateral lattice, wherein the webs have trapezoidal cross-sectional areas in places in the direction of growth, and laterally overgrowing the webs with a nitride semiconductor in a second growth step, to close spaces between the webs.

主权项

1. A method for producing an optoelectronic device with the following steps:
providing a substrate; applying a nucleation layer to a surface of the substrate; applying and patterning a mask layer on the nucleation layer; growing a nitride semiconductor in a first growth step, wherein webs are laid which form a lateral lattice, wherein the webs have trapezoidal cross-sectional areas in the direction of growth; laterally overgrowing the webs with a nitride semiconductor in a second growth step, to close spaces between the webs, wherein a surface of the webs having trapezoidal cross-sectional areas remote from the substrate is a c-surface running parallel to the substrate; and depositing, after the second growth step, a functional layer sequence comprising an actively luminous layer, wherein defects that extend in a vertical direction to the c-surface of the webs continue in the vertical direction and bring about a formation of v-defects in the functional layer sequence.