发明名称 Inspection of regions of interest using an electron beam system
摘要 A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system may include: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.
申请公布号 US9466462(B2) 申请公布日期 2016.10.11
申请号 US201414153923 申请日期 2014.01.13
申请人 APPLIED MATERIALS ISRAEL LTD. 发明人 Sender Benzion;Litman Alon
分类号 H01J37/26 主分类号 H01J37/26
代理机构 Kilpatrick Townsend & Stockton LLP 代理人 Kilpatrick Townsend & Stockton LLP
主权项 1. A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprising: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; and an imaging module for collecting electrons emanating from the substrate in response to a scanning of regions of interest by a charged particle beam; wherein the charged particle optics are arranged to perform counter movements of the charged particle beam in a direction of the stage movement during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest; wherein at least some regions of interest have an area that is less than one percent of a field of view of the charged particle optics.
地址 Rehovot IL