| 摘要 |
PURPOSE:To provide an electron beam exposure device which can expose an exposure region having even a trapezoidal shape by providing beams for calculating the exposure starting position information of the exposure region, the oblique angle information of a reference side and exposure scanning length in the deflecting means thereof. CONSTITUTION:An electron gun R4 having deflecting coils R2, R3 is disposed on the trapezoidal sub-straight SUB to be exposed to control the deflecting coils R2, R3 by a deflecting current supply unit R1'. This supply unit R1' consists of registers 1-6, a decoder 7, an adder 8, comparators 9, 11, counters 10, 13, an OR gate 12, D/A converters 14-18, and control circuit 19, etc., and is controlled through a data bus channel B, a data channel H and a memory M by an information processor C. The supply unit thus constructed supplies the exposure starting position information of the exposure region, the oblique information of the reference side for specifying the exposure region, exposure scanning length, etc. as various information to the deflecting coils R2, R3 so as to expose it along the trapezoidal shape. |
