| 摘要 |
Cephalosporin compounds of the formula (I): <IMAGE> (I) wherein R1 is a group of the formula: <IMAGE> in which X is sulfur, oxygen or substituted or unsubstituted imino, M is sulfur or oxygen, R2 is hydrogen, or a saturated or unsaturated aliphatic hydrocarbon residue, R3 is hydrogen or lower alkyl, R4 is hydrogen, halogen, lower alkyl, acyloxymethyl or heterocyclic-thiomethyl which may be substituted with lower alkyl, and R5 is carboxy or its derivative, and nontoxic, pharmaceutically salt thereof.
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