发明名称 MANUFACTURE OF PROJECTION FOR SUBSTRATE CONDUCTOR LAYER
摘要 PURPOSE:To shorten the steps of forming a projection made of a conductor layer for electrically connecting with the semiconductor element on a tape carrier and eliminate the isolation of a surface resist by executing the surface resist coating step after a back surface patterning step when forming the projection thereon. CONSTITUTION:Conductor layers 20 are coated and etched on a region of an insulating tape carrier 1 provided with conveying sprocket holes 5 at both side edges to form a connecting terminal 22 as below. That is, a conductor layer 20 made of copper foil or the like is coated on the respective regions of the carrier 1, a resist layer is formed on the back surface thereof, is patterned to form a mask 4 of the resist layer through the opening of the carrier 1. Thereafter, a protective resist layer 30 is coated on the surface of the conductor layer 20, is etched from the back surface to form a projection 21 on the layer 20. Thereafter, the layer 30 is modified to a resist layer 31 having predetermined pattern, the protective resist layer 60 is buried in the opening, is etched from the surface, the conductor layer 20 is retained as a connecting terminal 22 containing the projection 21, and the layer 60 is removed.
申请公布号 JPS568834(A) 申请公布日期 1981.01.29
申请号 JP19790083742 申请日期 1979.07.02
申请人 SUWA SEIKOSHA KK 发明人 HANIWARA KAZUYOSHI
分类号 H05K3/00;H01L21/60 主分类号 H05K3/00
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