| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a microstructure, which includes a step of forming a photoresist pattern and which enables formation of a photoresist pattern having a pointed portion in a sharper profile with high pattern accuracy without increasing an exposure frequency.SOLUTION: A photoresist pattern including a projection 22A having a pointed portion 22X is formed by applying a positive photoresist 21 on a substrate 10, scanning the photoresist 21 with a laser beam while modulating the beam intensity to expose the photoresist 21, and developing the photoresist 21. The application and exposure of the photoresist 21 are carried out in such a manner that a depth D from the surface of the photoresist 21 to a peak 22XT of the pointed portion 22X to be formed after the development is half or less than half of a film thickness T of the photoresist 21. |
