| 摘要 |
PURPOSE:To improve the efficiency and simplify the mass production of optical circuits by covering the whole surface of a base material with a sensitive glass layer and executing masking, exposing and etching removal to form optical paths having a prescribed pattern. CONSTITUTION:A sensitive glass layer 2 with even thickness is formed on almost all the surface of a base material 1 such as a quarz glass plate by a well- known film forming procedure. The surface of the sensitive glass layer 2 is masked 3 with a nontransmittable material so as to cover only the parts remaining as optical paths. Ultraviolet rays 4 are vertically irradiated over the masking parts 3 for a fixed period with an optical system and then a prescribed heat treatment is carried out to deposit crystal on the exposed part 2A of the sensitive glass layer 2. Then the exposed part 2A is etched with dilute hydrofluoric acid solution to remove the exposed part 2A. Thus, optical paths which are composed of sensitive glass having a prescribed pattern and have high section forming accuracy are formed on the base material 1 efficiently. |
