发明名称 Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
摘要 A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.
申请公布号 US9482963(B2) 申请公布日期 2016.11.01
申请号 US201113885066 申请日期 2011.12.02
申请人 ASML NETHERLANDS B.V. 发明人 Mulckhuyse Wouter Frans Willem;De Jager Pieter Willem Herman;Van Zwet Erwin John
分类号 G03F7/20 主分类号 G03F7/20
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. A method comprising: converting a representation of a pattern desired to be formed on a substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level to be set in a respective area of a patterning device in a lithographic apparatus such that the effect at the substrate of the respective radiation intensity levels being set in each area of the patterning device is the desired pattern, the patterning device comprising a plurality of individually controllable elements that each may be set to either a first state, in which radiation is directed to a corresponding portion of the substrate, or a second state, in which radiation is not directed to a corresponding portion of the substrate; converting each of the area intensity signals into a plurality of control signals for a respective plurality of individually controllable elements corresponding to the area of the patterning device such-that the individually controllable elements are set to appropriate states in order that the combined effect of setting all of the individually controllable elements in the area to the states in use is to provide the radiation intensity level for the area specified in the area intensity signal; and setting each of the individually controllable elements according to its associated control signal.
地址 Veldhoven NL