发明名称 |
Fine fabrication process using radiation sensitive resist |
摘要 |
A fine work process comprises forming a thin film made of a radiation sensitive polymer on a board; irradiating radiation; developing and etching the product. The radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: <IMAGE> wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups.
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申请公布号 |
US4367281(A) |
申请公布日期 |
1983.01.04 |
申请号 |
US19810289281 |
申请日期 |
1981.08.03 |
申请人 |
TOYO SODA MANUFACTURING CO., LTD. |
发明人 |
SHIBAYAMA, KIMIO;ITAYA, KINGO;FUJIMOTO, TERUO |
分类号 |
G03F7/038;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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