发明名称 SEMICONDUCTOR DEVICE RESPONDING TO ION
摘要 A device comprising a field effect transistor having a floating gate 20 formed on a first surface of a substrate 10 over gate oxide 13a and source and drain regions 11, 12. A responsive layer 15 is provided on the second surface of the substrate and is capacitatively coupled to the floating gate via a thin insulating membrane 13b at a location away from the transistor. The device is applicable in the biomedical domain.
申请公布号 JPS5870155(A) 申请公布日期 1983.04.26
申请号 JP19820127804 申请日期 1982.07.23
申请人 FUONDASHIYON SUISU PUURU RA RESHIERUSHIYU AN MIKUROTEKUNIKU 发明人 FUERITSUKUSU RUUDORUFU
分类号 G01N27/07;G01N27/00;G01N27/414;H01L29/78;H01L29/786;H01L29/788 主分类号 G01N27/07
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