| 摘要 |
PURPOSE:To obtain thin films of multielement alloys of arbitrary compsns. by an extremely simple method by controlling the relative position relations between a piece of electrode target consisiting of plural pieces of blank materials and a substrate and sputtering speed synchronously. CONSTITUTION:After a vacuum tank 1 is evacuated with a pump 2, a sputtering gas is introduced therein from a cylinder 3 through a flow rate controlling valve 4 and DC voltage is applied between the substrate 5 held on a mechanism 6 and the target 7 on an electrode mechanism 8 by an electric power source 10, whereby the substrate is sputtered. A shutter 13 and a shielding plate 9 are disposed between the target 7 and the substrate 5. Here, a disc consisting of semicircular blank materials A, B is used for the target 7, and is rotated by a moving mechanism 11. In synchronization with the rotation thereof, discharge electric power is changed by a synchronizing mechanism 12. Then the materials A, B are exposed periodically to the opening part of the plate 9, whereby sputtering is accomplished. |
