| 摘要 |
<p>PURPOSE:To obtain a filter having a clear pattern and enabling the pickup of an image with high image resolution by developing a filter base material with a developing soln. contg. a penetration inhibiting liq. CONSTITUTION:A thin film of a photosensitive org. polymer is provided on a glass substrate 31, exposed and developed to form a filter base material 32. A developing soln. to be used contains 5-50vol% penetration inhibiting liq., and the development is carried out while keeping the developing soln. at 25-50 deg.C. A solvent having dehydrating power and no affinity for the base material 32 such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, tert- butyl alcohol or 1-heptanol is used as the penetration inhibiting liq.</p> |
