SUBSTRATE SUPPORT DEVICE, SUBSTRATE SUPPORT METHOD AND VACUUM DRYING EQUIPMENT

摘要

The embodiments of the invention disclose a substrate support device, a support method and a vacuum drying equipment. The substrate support device comprises a fixed mechanism including a table board arranged with a plurality of via-holes, and a lifting mechanism including a plurality of flat plate parts corresponding to the via-holes, the plurality of flat plate parts being capable of moving into corresponding via-holes respectively to form a support surface for supporting the substrate, together with the table board, and further capable of moving to positions above the corresponding via-holes. In the embodiments of the invention, the substrate is always placed on the flat table board throughout the drying process by cooperating the fixed mechanism and the lifting mechanism. Thus, the contact mode between the substrate and the substrate support device is changed from a point contact to a surface contact, thereby reducing the risk of the product display deficiency.

主权项

1. A substrate support device for a vacuum drying equipment, comprising a fixed mechanism that includes a table board arranged with a plurality of via-holes, and a lifting mechanism that includes a plurality of flat plate parts corresponding to the via-holes, the plurality of flat plate parts being capable of moving into corresponding via-holes respectively to form a support surface for supporting the substrate, together with the table board, and further capable of moving to positions above the corresponding via-holes.