| 摘要 |
PURPOSE:To improve the yield of a thin film magnetic head, by forming a magnetic core pattern with a photomask of a pattern which is set symmetric to the center axis of a substrate and within the surface of the substrate after attaching a magnetic film to the substrate by means of a device containing an evaporating source at the outside of the substrate. CONSTITUTION:A photomask pattern 12 is designed so that the form of an element pattern is symmetric to the center line D-D' of the substrate which is parallel to the longer side of a target errosion area 11 under the substrate and that a front level difference part 5 is set inside. With use of such pattern 12, a magnetic film 4 is patterned. As a result, the attachment of a magnetic film (the film thickness ratio ts/t between a magnetic core and a flat part at a level difference part) satisfies >=0.8 at the part 5. This increases the yield. Thus it is possible to apply a planar magnetron type sputtering process that has the uniform magnetic characteristics and excellent reproducibility. |
