发明名称 Photosensitive material
摘要 A copolymer comprising (a) a monomer having a C7 to C21 perfluoroalkyl or perfluoroalkenyl group at one end of the molecule and an ethylenically unsaturated group at the other end of the molecule, and (b) a monomer having a photosensitive group, e.g. an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group or alpha , beta -unsaturated ketone group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for various purposes, e.g. as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.
申请公布号 US4424325(A) 申请公布日期 1984.01.03
申请号 US19810265571 申请日期 1981.05.20
申请人 DAIKIN KOGYO CO., LTD. 发明人 TSUNODA, TAKAHIRO;YAMAOKA, TSUGUO;TAMURA, SINJI
分类号 C08F20/00;C08F20/22;C08F220/24;G03F7/012;G03F7/038;(IPC1-7):C08F214/18 主分类号 C08F20/00
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