发明名称 PHOTOENGRAVING METHOD OF TYPE BY PHOTOSENSITIVE RESIN
摘要 PURPOSE:To photoengrave a type having high durability by covering a photosensitive resin with a negative film using a block copy of a type, subjecting the same to temporarily exposing and temporarily washing out, further covering the same with a negative film having a bolder type part and subjecting the same to normal exposing and normal washing. CONSTITUTION:A negative film 7 which is reversed in negative and positive is formed from a block copy 1, and the cover film 3 of a plate material 2 is stripped and is brought into tight contact with a photosensitive resin 4. Such resin is temporarily exposed then washed out whereby a temporary plate body 12 is obtd. A negative film 11 indicating a type M' bolder than the type M of the block copy is formed by making the exposing time longer in the stage for forming the negative film and after such film is brought into contact with the surface of the resin 4 formed with the body 12 and is subjected to normal exposure, the film is subjected to normal washing out, whereby a normal plate body 14 is obtd. The resulted body 14 has a stepped part 15 of a specified width on the circumference of the root part. Since the body 14 is securely supported by the stepped part 15, said plate body is strong to the impact with printing and is less vulnerable to chipping, cracking, etc.
申请公布号 JPS5930540(A) 申请公布日期 1984.02.18
申请号 JP19820090261 申请日期 1982.05.27
申请人 MURATA GIKEN KK;NIHON KATSUJI KOGYO KK 发明人 SOUMA MIKIO;ASADA TOMOSHI;OSADA SHIGEO
分类号 G03F7/00;G03F7/20;G03F7/26 主分类号 G03F7/00
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