发明名称 DEVICE FOR PRODUCING SEMICONDUCTOR
摘要 PURPOSE:To stick the powder flowing into a vacuum pump on a jig and to enable continuous operation for a long time by providing the jig in a vacuum vessel into which prescribed gas is introduced and which forms an amorphous semiconductor film on a substrate by glow discharge. CONSTITUTION:A conductive substrate is set on a sample holder 18 and thereafter a plane or cylindrical jig 21 which is perforated is installed around the above-mentioned conductive substrate. The inside of a vacuum vessel 16 is then evacuated and gas such as monosilane, methane, argon or the like is introduced therein and is maintained under a prescribed pressure. A high-frequency electric field is impressed on an electrode 19 to generate glow discharge, by which the gas is decomposed and an amorphous semiconductor film is formed on the substrate. The powder of silicon, etc. decomposed by the discharge is stuck on the jig by such device, whereby the powder flowing into a vacuum pump is decreased and the device is continuously operated for a long time.
申请公布号 JPS59143063(A) 申请公布日期 1984.08.16
申请号 JP19830014867 申请日期 1983.02.01
申请人 SUWA SEIKOSHA KK 发明人 OKA HIDEAKI
分类号 C23C16/50;C23C16/44;C23C16/507;G03G5/08;H01L21/205;H01L31/0248 主分类号 C23C16/50
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