| 摘要 |
PURPOSE:To obtain an electron beam- or X-ray-sensitive resin suitable for use as a resist and giving a fine image with high sensitivity and resolution by copolymerizing 2,3-epithiopropyl methacrylate with a specified vinyl monomer. CONSTITUTION:2,3-Epithiopropyl methacrylate and a vinyl monomer represented by the formula (where R<1> is H or methyl, and R<2> is 6-22C alkyl, cyclohexyl, phenyl or benzyl) such as hexyl acrylate are dissolved in an org. solvent which is a solvent for the resulting copolymer such as n-hexane. They are mixed, and after adding a polymn. initiator such as azonitrile, the monomers are copolymerized. The resulting copolymer is charged into a large amount of a nonsolvent to cause precipitation. Dissolution and precipitation may be repeated. By the purification the desired electron beam- or X-ray-sensitive resin having 5-30 deg.C glass transition temp. is obtd. |
