| 摘要 |
PROBLEM TO BE SOLVED: To provide a film with an inorganic thin film having uniform film quality in a film width direction, and to provide a method and apparatus for manufacturing the film.SOLUTION: In a method for manufacturing a film with an inorganic thin film where a SiOx layer (1.5≤x≤2.0) is laminated on a transparent film by sputtering, an upstream-side Si target and a downstream-side Si target are separately installed in the conveyance direction of the transparent film, and the upstream-side Si target and the downstream-side Si target are connected to an MF power source. Argon gas as a carrier gas at the time of sputtering is made to flow from the upstream-side end of the upstream-side Si target to the downstream-side Si target, and is supplied from the downstream end of the downstream-side Si target to the upstream-side Si target. Oxygen gas as a reactive gas at the time of sputtering is only supplied from the downstream end of the downstream-side Si target to the upstream-side Si target. |
