发明名称 MATRIX FOR HARDENING PHOTO-SETTING RESIN
摘要 PURPOSE:To provide the title matrix having excellent dimensional accuracy and surface accuracy while retaining chemical stability, molding releasing property and durability, which is formed from a polyfluorocarbon resin and comprising a heat-resistant transparent plate in a resin layer. CONSTITUTION:For example, the heat-resistant transparent plate 2 is sandwiched between polyfluorocarbon resin sheets 1, the sandwich form body is integrally formed by placing it on a master form 3, and the master form 3 is removed, thereby obtaining the desired matrix consisting of the resin layer incorporating the plate 2 therein. The resin is preferably a tetrafluoroethylene-hexafluoropropylene copolymer or the like, and the transparent plate is preferably formed from an inorganic glass having SiO2 as a basic skeleton, e.g., soda glass.
申请公布号 JPS60242014(A) 申请公布日期 1985.12.02
申请号 JP19840098965 申请日期 1984.05.17
申请人 SUWA SEIKOSHA KK 发明人 TODA SHIGEO;KANAI MASAO;ARAYA YUTAKA
分类号 B29C39/26;B29C33/38;B29C33/40;B29C35/08;B29C43/18;B29C70/70;B29K101/00;B29L31/48;G04B19/06 主分类号 B29C39/26
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