| 摘要 |
PURPOSE:To change the vapor deposition velocity in a short time by poviding a shutter having plural fine slits whose width is adjustable to the titled vapor deposition device, and rendering the permeability of vapor-deposition particles controllable. CONSTITUTION:A substrate 4 to be vapor-deposited and a crucible 2 contg. a vaporization material 1 are arranged opposite to each other in a vacuum vessel 9. The inside of the vessel 9 is made vacuum, the vaporization material 1 in the crucible 2 si vaporized by a heater 3, and the vapor is deposited on the surface of the substrate 4. A shutter mechanism 10, constituted of two slit-plates 11 and 13, is placed between the substrate 4 and the vaporization material 1. Both slit- plates 11 and 13 are relatively shifted to control freely the passage of the vaporized particles of the vaporization material 1. Accordingly, when the vapor deposition velocity is changed, the velocity can be easily changed by regulating the width of the slit which is formed by both slit-plates 11 and 13. |
