发明名称 X線光学システム
摘要 PROBLEM TO BE SOLVED: To provide an X-ray optical system for constructing an AKB mirror optical system consisting of four total reflection X-ray mirrors in order to constitute an image formation type X-ray microscope and an X-ray measurement device by reducing or expanding X-rays without aberration with high resolution.SOLUTION: An X-ray optical system includes: a mirror manipulator 10 in which a horizontal stage 11 and a vertical stage 12 are arranged in an optical axis direction L of X-rays, the horizontal stage is provided with a horizontal elliptic mirror M1 and a horizontal hyperbolic mirror M3 to be finely adjustable, the vertical stage is provided with a vertical elliptic mirror M2 and a vertical hyperbolic mirror M4 to be finely adjustable, front and rear position relation between the horizontal elliptic mirror and the horizontal hyperbolic mirror and front and rear position relation between the vertical elliptic mirror and the vertical hyperbolic mirror in the optical axis direction are set to the same; and alignment monitoring means 20 for giving a standard for finely adjusting a horizontal posture of the horizontal elliptic mirror and the horizontal hyperbolic mirror and a vertical posture of the vertical elliptic mirror and the vertical hyperbolic mirror so as to be ideal postures off line.
申请公布号 JP6048867(B2) 申请公布日期 2016.12.21
申请号 JP20120094281 申请日期 2012.04.17
申请人 国立大学法人大阪大学;株式会社ジェイテックコーポレーション 发明人 松山 智至
分类号 G21K1/06;G21K1/00 主分类号 G21K1/06
代理机构 代理人
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