发明名称 |
SEMICONDUCTOR VAPOR PHASE GROWING APPARATUS |
摘要 |
The appts. comprises a furnace and control appts. There is a thermocoupler for the wafer and a heat controller. The control appts. comprises a memory device and an operating system. The memory device stores standard temps. and the sequences for the heat controller. Temp. is controlled linearly to the aimed temp. during the temp. increasing or temp. decreasing sequence. The process reduces time and thermal shock to the wafer. |
申请公布号 |
KR860000252(B1) |
申请公布日期 |
1986.03.21 |
申请号 |
KR19830001099 |
申请日期 |
1983.03.18 |
申请人 |
TOSHIBA MACHINE CO.,LTD |
发明人 |
EBATA HITOSHI |
分类号 |
C23C16/52;C30B25/16;H01L21/205;H01L21/31;(IPC1-7):H01L21/205 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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