发明名称 ION SOURCE WITH SOLID-EVAPORATING FURNACE
摘要 PURPOSE:To reduce fluctuations of ion beams being generated by mechanically changing an opening area of a pipe, through which a sample vapor in an evaporating furnace for heating a solid sample is introduced into an ion source chamber, correspondingly to the furnace temperature for heating. CONSTITUTION:An ion source with a solid-evaporating furnace, in which a solid sample 1''' is heated and vaporized with heaters 1' and introduced into a microwave ion source chamber through an introduction pipe 2, and the temperature in an evaporating furnace 1 is detected by a thermocouple so as to control the heaters 1', is formed. Moreover, a mobile rod 10, which is moved by a bimetal 9 formed of an amber and bronze combination and the like so as to be capable of changing an area of the opening part, is positioned at the opening part of the introduction pipe 2. Hence, flowing of a large amount of vapors into the ion source chamber, caused by overshooting and runaway of the temperature in the evaporating furnace 1, can be prevented, with functions of beam current stability, withstand voltage, and the like of the ion source being maintained favorably.
申请公布号 JPS61148748(A) 申请公布日期 1986.07.07
申请号 JP19840270869 申请日期 1984.12.24
申请人 HITACHI LTD 发明人 TOKIKUCHI KATSUMI;SAKUMICHI KUNIYUKI;KOIKE HIDEMI
分类号 H01J37/08;H01J27/02;H01J27/08 主分类号 H01J37/08
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