| 摘要 |
PURPOSE:To prevent a painting quality from varying due to the difference of evaporation amount by forcibly feeding a solvent vapor stream into a treating vessel, painting in a solvent vapor atmosphere, thereby suppressing the evaporation of a painting material. CONSTITUTION:When air is flowed over a solvent tank 7 as gas is fed from an inlet 3, the solvent 8 of the tank 7 is intaken into the air stream while aiding the evaporation to form a vapor stream. The vapor stream is forcibly fed from the inlet 3 into a treating vessel 1 to form a solvent vapor atmosphere in the vessel 1. A wafer 10 as an element to be painted is placed on a spin head 2, held and rotated. When a resist solution 5 is dropped from a dropping tube 6 onto the center of the wafer 10, the solution 5 is radially diffused by a centrifugal force to be coated on the surface of the wafer 10. |
