| 摘要 |
PURPOSE:To prevent a charge-up phenomenon and to facilitate the control of the rate of vapor deposition by heating an evaporating material to a temp. slightly lower than the evaporation temp. and irradiating electron beams on the material. CONSTITUTION:An evaporating material is evaporated by irradiating electron beams on the material, and the resulting vapor is deposited to form a thin film. At this time, the evaporating material is heated to a temp. slightly lower than the evaporation temp. with a resistance heating element or the like before electron beams are irradiated on the material.
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