| 摘要 |
PURPOSE:To improve a productivity in a drawing with electron beams by reducing the number of movements of a sample by performing the drawing in a deflection region by providing an electron beam deflection signal generating part. CONSTITUTION:In an electron beam deflection signal generating part 13, the components of the respective axis of an irradiated position coordinates (X, Y) of pellet regions P1-P4 inputted from an electron beam irradiated position signal generating part 12 and the position coordinates (X, Y) of pellet regions P1-P4 in a deflection region 14 of an electron beam B inputted directly form a control part 7 are applied to an electron beam deflector 3 through adding devices 13a and 13b and deflection signal amplifiers 13c and 13d. Accordingly, the reaching position on a wafer 4 of the electron beam B which was projected from an electron gun 1 and whose photoelectron plane has been shaped into a predetermined form by an electron beam shaping device 2 is corrected in order only by the values of the center coordinates of the pellet regions P1, P2, P3 and P4. Consequently, the drawing of a predetermined figure can be performed without moving the wafer 4 to an optical axis A of an electron optical system E.
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