发明名称 |
A process for producing a solar cell arrangement |
摘要 |
<p>On a substrate 1 a first electrode layer 2 is firstly deposited over a large area and excavated in regions 3. In considerable simplification of conventional processes, a photosensitive semiconductor layer 5 as well as a second electrode layer 6 are then directly successively applied over the same large area by vacuum deposition. Only after this is the excavation of these layers in regions 7 and 9 as well as the final series wiring by appropriate contact elements 10 effected. The second electrode layer 6 is advantageously excavated by etching, the semiconductor layer 5 by local application of ultrasonics. <IMAGE></p> |
申请公布号 |
GB2184601(A) |
申请公布日期 |
1987.06.24 |
申请号 |
GB19860030193 |
申请日期 |
1986.12.17 |
申请人 |
* MESSERSCHMITT-BOLKOW-BLOHM GMBH |
发明人 |
KLAUS * THALHEIMER;GUNTHER * MUCK;VOLKER * SCHIRM;WOLFGANG * LEGNER |
分类号 |
H01L31/0224;H01L31/046;(IPC1-7):H01L25/04 |
主分类号 |
H01L31/0224 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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