发明名称 |
METHOD OF MEASURING POSITION OF TWO-DIMENSIONAL PATTERN WITHHIGH PRECISION AND REFERENCE MASK |
摘要 |
A method for high precision position measurement of two-dimensional structures such as structures on semiconductor wafers or masks, utilizing a reference mask having a two-dimensional grid, the relative position of the structures relative to the grid being identified by opto-electronic scanning using an image sensor and subsequent image processing. The absolute position of the structures to be measured can then be identified from the position of the grid elements. A reference mask is preferably employed whose grid elements carry a binary coding which can be read and decoded by the image processing means. The coding thereby indicates the position of the grid elements in the grid. |
申请公布号 |
JPS62145103(A) |
申请公布日期 |
1987.06.29 |
申请号 |
JP19860293311 |
申请日期 |
1986.12.09 |
申请人 |
SIEMENS AG |
发明人 |
GIYUNTAA DEEMENSU;HERUBERUTO AIGENSHIYUTETSUTAA;PEETAA MENGERU |
分类号 |
G01B11/00;G03F7/20;G03F9/00;H01L21/027;H01L21/67;H01L21/68 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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