发明名称 SPUTTERING METHOD FOR FERROMAGNETIC MATERIAL
摘要 PURPOSE:To make continuous and efficient film formation at a high speed by positioning a ferromagnetic material between the surfaces of magnet bodies on one side where the N and S poles thereof face each other and generating external magnetic fields between the S and N poles of the surfaces on the other side. CONSTITUTION:A magnetic field generator is constituted by providing the magnet bodies 10, 11 disposed with the N and S poles on one side so as to face each other and positioning the ferromagnetic material 12 which acts as a target between the N and S poles facing each other of the respective magnet bodies 10, 11. Fe, Ni or the alloy thereof is used for the target 12 to constitute part of a magnetic circuit formed of the magnet bodies 10, 11. The external magnetic fields passing the outside of the target 12 are formed between the S and N poles 10b and 11b on the other side by the magnet bodies 10, 11 to capture plasma. The plasma density is thereby increased and the electrons are made to rotate around the target 12, by which the efficient sputtering is executed.
申请公布号 JPS62149869(A) 申请公布日期 1987.07.03
申请号 JP19850289971 申请日期 1985.12.23
申请人 TDK CORP 发明人 OKAZAKI KOICHIRO;OTAKA MASAICHI
分类号 C23C14/36;C23C14/35 主分类号 C23C14/36
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