发明名称 Asymmetrical chamber configuration
摘要 A production tool includes a chamber, a heater in the chamber, and a pumping outlet on a side of the heater. A pumping liner is in the chamber and encircling the heater. The pumping liner and the heater have a first gap therebetween and a second gap therebetween. The second gap is different from the first gap, and the second gap is farther away from the first pumping outlet than the first gap.
申请公布号 US9490152(B2) 申请公布日期 2016.11.08
申请号 US201213482814 申请日期 2012.05.29
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Wang Lan-Hai;Liu Ding-I;Liao Si-Wen;Yang Yong-Hung;Hsu Jia-Wei
分类号 C23C16/455;H01L21/67;H01L21/762 主分类号 C23C16/455
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. An apparatus comprising: a center outlet pipe; a first reactor, a second reactor, and a third reactor surrounding the center outlet pipe and separated from each other by 120 degrees from each other, wherein each of the first reactor, the second reactor, and the second reactor comprises: a chamber;a heater in the chamber;a pumping outlet on a side of the heater, wherein the pumping outlet is connected to the center outlet pipe; anda pumping liner in the chamber and encircling the heater, wherein the pumping liner and the heater have a first gap therebetween, and a second gap therebetween, with the first gap and the second gap being measured in a same plane parallel to a major top surface of the heater, wherein the second gap is greater than the first gap, and wherein the second gap is farther away from the pumping outlet than the first gap.
地址 Hsin-Chu TW