发明名称 VAPOUR DEPOSITION GROWTH OF GROUP II-VI SEMICONDUCTOR MATERIALS
摘要 A method for growing a Group II-VI epitaxial layer over a substrate is described. The method includes the steps of directing a plurality of vapor flows towards the substrate, including a Group II organic vapor, a Group VI organic vapor, and a Group II elemental mercury vapor. At least one of the Group II organic vapor and Group VI organic vapor has organic groups which sterically repulse the second one of the Group II and Group VI organic vapors or which provide electron transfer to the Group II atom or electron withdrawal from the Group VI atom. With the particular arrangements described, it is believed that substantially independent pyrolsis of the Group II organic vapor is provided over the growth region of the substrate, and accordingly, Group II depletions such as cadmium depletion in the epitaxial films provided over the substrate is substantially reduced.
申请公布号 GB8729380(D0) 申请公布日期 1988.01.27
申请号 GB19870029380 申请日期 1987.12.16
申请人 RAYTHEON CO 发明人
分类号 H01L33/00;C23C16/18;C30B25/02;H01L21/365 主分类号 H01L33/00
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