发明名称 |
RADICAL GENERATOR AND MOLECULAR BEAM EPITAXY APPARATUS |
摘要 |
A molecular beam epitaxy apparatus includes a radical generator for generating a radical species, a molecular beam cell for generating a molecular beam or an atomic beam, and a vacuum chamber for accommodating a substrate therein, in use, the substrate being irradiated with the radical species and the molecular beam or the atomic beam in vacuum, to thereby form, on the substrate, a crystal of a compound derived from the element of the radical species and the element of the molecular beam or the atomic beam. |
申请公布号 |
US2016355946(A1) |
申请公布日期 |
2016.12.08 |
申请号 |
US201615242263 |
申请日期 |
2016.08.19 |
申请人 |
National University Corporation Nagoya University ;NU ECO Engineering Co., Ltd. ;Katagiri Engineering Co., Ltd. |
发明人 |
HORI Masaru;AMANO Hiroshi;KANO Hiroyuki;DEN Shoji;YAMAKAWA Koji |
分类号 |
C30B25/14;H01J37/32;H01J37/317;C30B29/40 |
主分类号 |
C30B25/14 |
代理机构 |
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代理人 |
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主权项 |
1. A molecular beam epitaxy apparatus comprising:
a radical generator for generating a radical species, a molecular beam cell for generating a molecular beam or an atomic beam, and a vacuum chamber for accommodating a substrate therein, in use, the substrate being irradiated with the radical species and the molecular beam or the atomic beam in vacuum, to thereby form, on the substrate, a crystal of a compound derived from the element of the radical species and the element of the molecular beam or the atomic beam, the radical generator comprising: a supply tube for supplying a gas; a plasma-generating tube made of a dielectric material, the plasma-generating tube being connected to the supply tube at the downstream end thereof; a coil winding about the outer circumference of the plasma-generating tube, for generating an inductively coupled plasma in the plasma-generating tube; and an electrode which covers the outer wall of the plasma-generating tube and which is disposed between the coil and the supply tube, for generating a capacitively coupled plasma in the plasma-generating tube and adding the capacitively coupled plasma to the inductively coupled plasma. |
地址 |
Nagoya-shi JP |