| 摘要 |
PURPOSE:To prevent attachment of liquid to the inner wall of a treating chamber due to liquifaction of gas, by providing the structure of a constant temperature chamber provided at the outer surface of the treating chamber so that the heated gas or liquid can be flowed in the constant temperature chamber. CONSTITUTION:A constant temperature chamber 8 comprising an outer wall 9 and a treating chamber 1 is constituted so as to keep airtightness. An air feeding path 10 is provided at a part of the outer wall 9. A gas (e.g., He) or liquid (e.g., water), which is heated to the liquifying point or more, is introduced through the air feeding path 10. The inside of the constant temperature chamber 8 is uniformly filled with the gas or the liquid. Therefore the temperature in the vicinity of the inner wall of the treating chamber 1 is kept at the liquifying point of the reacting gas all the time. The reacting gas or the gas yielded by the reaction is not liquified, and the liquid is not attached to the inner wall of the treating chamber 1. Therefore it is not necessary to wash the inner wall of the treating chamber 1 periodically. The inside of the treating chamber 1 can be kept at a high cleanness degree.
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