| 摘要 |
PURPOSE:To produce a magnetically soft film with excellent characteristics highly efficiently by a method wherein Kr gas is employed as sputtering gas in a sputtering method which employs a magnetically soft alloy as a target. CONSTITUTION:A magnetically soft film which can be formed is an amorphous film made of alloy expressed by Co-M (wherein M denotes at least one of Y, Zr, Nb, Hf, Ta, W, Ti, Fe, Si, B and Mo) or a film whose composition is expressed by Fe-Al-Si. A radio frequency magnetron is employed as a sputtering apparatus. Kr gas is ionized and the Kr ions are introduced onto the target alloy and make metal particles emitted from the alloy and adhere to a substrate to form a film. With this constitution, a magnetically soft film with excellent characteristics can be obtained. Moreover, as the RF power can be increased, the film forming speed can be increased and the highly efficient film formation of the magnetically soft film can be achieved.
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