发明名称 INSPECTION OF DEFECT IN MASK AND SO ON AND DEVICE THEREFOR
摘要 PURPOSE:To observe and inspect defects in a mask with good accuracy by a method wherein a convergent light is irradiated on part of the surface of a sample at a prescribed angle and the sample surface irradiated with the convergent light is observed from an angle different from the angle of irradiation of the convergent light. CONSTITUTION:The inspection of defects in a sample 1 is conducted by a method wherein a convergent light 4A is irradiated on part of the surface of the sample 1 at a prescribed angle and the surface, which is irradiated with the convergent light 4A, of the sample 1 is observed by an observer 5 at an angle different from the angle of irradiation of this convergent light 4A. By performing this observation about within the prescribed region of the surface of the sample 1, a fine defect, that is, a damaged part and the existence of a foreign substance are clarified and the defect can be observed and inspected with good accuracy, because the convergent light 4A is locally irradiated on the surface of the sample 1 and the unnecessary reflection and scattering on the surface of the sample 1 can be reduced. Moreover, by providing a defect inspecting unit with a supporting stand 2 and a moving unit 3, the prescribed region or whole region of the surface of the sample 1 having a comparatively large area can be easily inspected with good accuracy.
申请公布号 JPS63152139(A) 申请公布日期 1988.06.24
申请号 JP19860298728 申请日期 1986.12.17
申请人 HITACHI LTD 发明人 EYA KUNIO
分类号 H01L21/66;G01N21/88;G01N21/94;G01N21/956;G03F1/84;H01L21/027;H01L21/30 主分类号 H01L21/66
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