发明名称 |
GAS DISCHARGE DERIVED ANNULAR PLASMA PINCH X-RAY SOURCE |
摘要 |
<p>TITLE GAS DISCHARGE DERIVED ANNULAR PLASMA PINCH X-RAY SOURCE INVENTORS RAJENDRA P. GUPTA MLADEN M. KEKEZ JOHN H. LAU GARY D. LOUGHEED This invention describes a pulsed plasma pinch x-ray source. In the device the initial plasma annulus is derived from an electrical gas discharge in a chamber having constricted openings arranged on a circle. This low mass plasma annulus is imploded and pinched by passing high current axially through said annulus. The hot and dense pinched plasma copiously emits x-rays and has the capability of being fired at high repetition rates. The device is simple for commercial applications, such as x-ray lithography.</p> |
申请公布号 |
CA1239486(A) |
申请公布日期 |
1988.07.19 |
申请号 |
CA19850492226 |
申请日期 |
1985.10.03 |
申请人 |
MAJESTY (HER) IN RIGHT OF CANADA AS REPRESENTED BY THE NATIONAL R |
发明人 |
GUPTA, RAJENDRA P.;KEKEZ, MLADEN M.;LAU, JOHN H.;LOUGHEED, GARY D. |
分类号 |
G03F7/20;H05G2/00;(IPC1-7):H01J35/00;H05G1/00 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|