发明名称 GAS DISCHARGE DERIVED ANNULAR PLASMA PINCH X-RAY SOURCE
摘要 <p>TITLE GAS DISCHARGE DERIVED ANNULAR PLASMA PINCH X-RAY SOURCE INVENTORS RAJENDRA P. GUPTA MLADEN M. KEKEZ JOHN H. LAU GARY D. LOUGHEED This invention describes a pulsed plasma pinch x-ray source. In the device the initial plasma annulus is derived from an electrical gas discharge in a chamber having constricted openings arranged on a circle. This low mass plasma annulus is imploded and pinched by passing high current axially through said annulus. The hot and dense pinched plasma copiously emits x-rays and has the capability of being fired at high repetition rates. The device is simple for commercial applications, such as x-ray lithography.</p>
申请公布号 CA1239486(A) 申请公布日期 1988.07.19
申请号 CA19850492226 申请日期 1985.10.03
申请人 MAJESTY (HER) IN RIGHT OF CANADA AS REPRESENTED BY THE NATIONAL R 发明人 GUPTA, RAJENDRA P.;KEKEZ, MLADEN M.;LAU, JOHN H.;LOUGHEED, GARY D.
分类号 G03F7/20;H05G2/00;(IPC1-7):H01J35/00;H05G1/00 主分类号 G03F7/20
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