| 摘要 |
PURPOSE:To make it possible to obtain a high ion current with a large area and improve parallelism by providing a single crystal material film on a parallel ion beam pulling out part from a gas plasma chamber. CONSTITUTION:In a plasma container 1, a RF electrode 2, which impresses high frequency on the gas inside the plasma container 1, is set up being coupled with a RF power supply 3, a gas introduction opening 4 and a vacuum drawing opening 5 are set up, further in the plasma container 1, an acceleration electrode 6 for accelerating/ions in plasma is provided being coupled with an acceleration power supply 7 and a single crystal film 8 is pasted up in opposition to the acceleration electrode 6. From a single crystal 8, accelerated ions from the container 1 are pulled out being arranged in one direction by a single crystal grid and a channeling phenomenon.
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