RINSE LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

摘要

In order to achieve both extremely high pattern collapse performance and bridge performance in a high-precision fine pattern, there are provided: a rinse liquid which is used for a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition and contains a hydrocarbon solvent having a branched alkyl group; a pattern forming method using this rinse liquid; and an electronic device manufacturing method including this pattern forming method.