| 摘要 |
PURPOSE:To obtain the titled composition, consisting essentially of a photosensitive modified alkyd polymer prepared by reacting a specific alkyd polymer with quinone diazides and useful for forming resist patterns in printed circuit boards, etc. CONSTITUTION:The aimed composition consisting essentially of a photosensitive alkyd polymer obtained by blending (A) an alkyd polymer having 30-300 acid value, 30-300 hydroxyl value and >=0.1 relative viscosity with (B) quinone diazides (e.g. 1,2-naphthoquinone-2-azido-5-sulfonyl chloride). Furthermore, the above-mentioned photosensitive modified alkyd polymer has preferably >=30% addition rate of the quinone diazide groups based on the hydroxyl value.
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